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Equipment Daily Abbreviations

機台每天會用到的縮寫
共 13 個字
— 縮寫表 · 共 13 個字 —
EEEquipment Engineer
字母分開念:E-E· /iː iː/
設備工程師 — 負責讓 fab 機台運作的工程師。
Page the EE on call — chamber B alarm.
PMPreventive Maintenance
字母分開念:P-M· /piː ɛm/
預防保養 — 定期換零件、清潔、校正。沒做 PM 就會 unscheduled down。
Quarterly PM on the wet bench is scheduled for Saturday.
CMCorrective Maintenance
字母分開念:C-M· /siː ɛm/
故障維修 — 機台已經壞了之後的修復,臨時 + 急。
CM action: replaced the upper electrode; back online in 3h.
OEEOverall Equipment Effectiveness
字母分開念:O-E-E· /oʊ iː iː/
整體設備效能 — uptime × performance × quality 的綜合指標。世界級 fab > 85%。
OEE on the etch cluster is 78%; target is 85%.
UptimeUptime
念整個字「ʌptaɪm」· /ˈʌptaɪm/
運轉時間百分比 — 機台正常運作的時間占比。
Tool uptime dropped to 88% this week — too many CMs.
DowntimeDowntime
念整個字「daʊntaɪm」· /ˈdaʊntaɪm/
停機時間 — 包含 PM 跟 CM 的所有非生產時間。
Unscheduled downtime cost us 200 wafers this morning.
MTBFMean Time Between Failures
字母分開念:M-T-B-F· /ɛm tiː biː ɛf/
平均故障間隔 — 兩次故障之間平均運作時間,越長越好。
MTBF on this etcher dropped after the new gas line install.
MTTRMean Time To Repair
字母分開念:M-T-T-R· /ɛm tiː tiː ɑːr/
平均修復時間 — 壞了多久能修好。
MTTR for the chuck swap is 4 hours — too long.
QualTool Qualification
念整個字「kwɒl」· /kwɒl/
機台認證 — 新機台或大修後跑特定 wafer 驗證表現,通過才能放回生產線。
Pushing through tool qual after the chamber rebuild.
FFUFan Filter Unit
字母分開念:F-F-U· /ɛf ɛf juː/
風扇過濾單元 — 無塵室天花板的吹風 + 過濾單元。維持 cleanroom class。
FFU vibration alarm on bay 5 — replace the fan motor.
LeakVacuum / Gas Leak
念整個字「liːk」· /liːk/
洩漏 — 真空腔或氣體管路漏氣。leak 找出來不容易,要做 leak check。
Helium leak check shows 1E-9 mbar·L/s — within spec.
RF MatchRF Matching Network
念整個字「ɑːr ɛf mætʃ」· /ɑːr ɛf mætʃ/
射頻匹配 — 電漿機台的射頻電源匹配電路,匹配不良 → 電漿不穩。
RF match reflected power high — adjust capacitor positions.
VendorEquipment Vendor
念整個字「vɛndər」· /ˈvɛndər/
機台廠商 — ASML / AMAT / TEL / LAM 等。EE 處理不了的問題就 call vendor。
Escalating to vendor — chamber leak we can't isolate.
動詞搭配 · Verb Collocations · 共 9 條 —
tool goes down / is recovered / is qualifiedtool / scanner / etcher + goes down / is recovered / is qualified

機台停機 / 復機 / 認證。EE 部門的日常動詞三件套。

  • Tool E2 went down at 03:00 for chamber leak check; ETA recovery 09:00.
  • Tool is recovered and qualified — back online for production.
PM extends / wraps up / kicks offPM + extends / wraps up / kicks off / slips

保養延長 / 完成 / 開始 / 延遲。PM 超時是 OEE 的隱形殺手。

  • PM extended by 4 hours due to a gasket failure during reassembly.
  • PM wrapped up at 08:30; tool re-qualified, production restored at 09:30.
OEE drops to N%OEE + drops / climbs / settles at [N]%

整體設備效能掉到 / 上升 / 穩定在 N%。OEE 是 EE 的 KPI 看板數字。

  • OEE on the litho cluster dropped to 76% — three unscheduled CMs this week.
  • OEE climbed back to 88% after stabilizing the chamber matching issue.
MTBF degrades / improvesMTBF + degrades / improves / falls / rises

MTBF 變短 / 變長。MTBF 變短意味機台老化或維護不到位。

  • MTBF on the etcher degraded from 200 hours to 140 after the gas line install.
  • MTBF improved by 30% after upgrading the chuck heater control.
MTTR improves / drags outMTTR + improves / drags out / climbs

MTTR 改善 / 變長 / 上升。MTTR 長代表修復太慢 — 通常缺料或缺技術。

  • MTTR for chuck swap dragged out to 6 hours — vendor sent the wrong gasket.
  • MTTR improved to 3 hours after stocking spare upper electrodes locally.
leak is detected / isolated / sealedleak + is detected / isolated / sealed / found

洩漏被偵測 / 隔離 / 密封 / 找到。Leak check 用 helium 找,可達 1E-9 mbar·L/s。

  • Helium leak detected at the lower flange — sealed and re-tested.
  • Leak isolated to the gas line elbow joint; replaced and pressure-tested OK.
RF match drifts / failsRF match + drifts / fails / tunes / locks

射頻匹配飄移 / 故障 / 調整 / 鎖定。RF match 飄了電漿就不穩。

  • RF match drifted causing reflected power to climb from 5W to 30W.
  • RF match locks at the new setpoint after the impedance re-tune.
qualification passes / fails / is pendingqualification / qual + passes / fails / is pending

機台認證通過 / 失敗 / 待處理。Tool re-qual 沒過就上不了線。

  • Qualification passes after the chamber rebuild — releasing to production.
  • Qual is pending overlay metrology data; expect sign-off by tomorrow.
vendor is engaged / escalated tovendor + is engaged / escalated to / brought in

廠商被叫進來 / 升級求助。EE 處理不了就要 vendor。

  • Vendor engaged — chamber B leak we can't isolate locally.
  • Escalated to vendor field engineer; on-site arrival ETA tomorrow afternoon.
句型 · Sentence Patterns · 共 5 條 —

daily tool status

Tool tool_id is down for reason; ETA recovery time; WIP impact: N lots.

{機台} 因 {原因} 停機;預計復機 {時間};WIP 衝擊 {N} 批。EE 早會的標準報告句。

  • Tool LITHO-07 is down for chuck swap; ETA recovery 18:00; WIP impact: 12 lots.
  • Tool E2 is down for chamber clean; ETA recovery 4 hours; WIP impact: 3 lots.

PM extension report

PM on tool extended by N hours due to issue; root cause: cause; recovery action: action.

{機台} 的 PM 延長 {N} 小時,因 {問題};根因:{cause};恢復動作:{action}。

  • PM on E2 extended by 4 hours due to gasket failure; root cause: gasket aged beyond 2-year service life; recovery action: replaced gasket and pressure-tested.
  • PM on LITHO-07 extended by 8 hours due to chuck encoder misalignment; root cause: thermal expansion mismatch; recovery action: realigned and verified with monitor lot.

weekly OEE report

OEE on module this week: N%; vs target target%; gap driven by factor.

本週 {模組} 的 OEE:{N}%;目標 {target}%;差距由 {因子} 驅動。EE 週報必出現的句子。

  • OEE on the etch cluster this week: 78%; vs target 85%; gap driven by three unscheduled CMs on chamber A.
  • OEE on the litho module this week: 90%; vs target 85%; gap closed after PM optimization.

leak check report

Leak check on chamber: result; action; tool re-qualified by check.

{腔體} 洩漏檢查:{結果};{動作};以 {確認} 重新認證機台。

  • Leak check on E2 chamber B: 5E-8 mbar·L/s detected at lower flange; replaced O-ring and re-tested at 1E-9 mbar·L/s; tool re-qualified by 25-wafer particle monitor.
  • Leak check on TF-04 chamber A: no leak detected; chamber sealed and pumped down; tool re-qualified by 5-wafer thickness monitor.

vendor escalation

Escalating to vendor on tool_id: symptom since date; in-house attempts: attempts; ETA on-site: eta.

對 {機台} 升級到廠商:從 {日期} 開始的 {症狀};內部嘗試:{attempts};到場 ETA:{eta}。

  • Escalating to vendor on LITHO-07: chuck thermal drift since 03/10; in-house attempts: encoder realignment, controller reset, both ineffective; ETA on-site: 03/14 afternoon.
  • Escalating to vendor on E2: intermittent RF mismatch since 02/28; in-house attempts: capacitor tuning, impedance re-cal, both ineffective; ETA on-site: 03/01 morning.
真實場景 · Real Scenarios · 共 3 條 —

Email — Unscheduled Tool Down

EE 半夜 03:30 發 broadcast email,scanner 突發故障。

Subject: [HOT] LITHO-07 unscheduled down — chuck encoder failure

All,

Heads up — LITHO-07 went down at 03:15 with chuck encoder alarm.

Symptom: Encoder reads jumping ±2° on the chuck rotation axis. Mechanical inspection on site shows worn bearing in the encoder housing.

Plan:
- Encoder swap in progress; expected complete at 06:00.
- Re-cal and qualification with 5 monitor wafers: 06:00 — 09:00.
- Production resume target: 09:00.

WIP impact:
- 8 critical lots queued; 5 rerouted to LITHO-09 and -11. Remaining 3 on hold for LITHO-07 (recipe-specific).
- Product X M2 layer delayed by ~6 hours.
- No customer impact (no hot lots in queue).

Will send recovery update at 06:00 and at qual completion.

Thanks,
EE on call

相關縮寫:scanner · qualification · WIP · PM

Conf Call — Weekly OEE Review

EE 主管月度 OEE review,fab 經理在場。

Thanks everyone. Quick walk through this week's OEE.

Overall: 84.5%, slightly below the 85% target. Three modules drove the gap.

Litho cluster: 76% OEE, target 85%. Three unscheduled CMs this week — two on LITHO-07 (chuck encoder), one on LITHO-09 (RF amp). Total downtime 32 hours. Chuck encoder failure on LITHO-07 is the headline — root cause was a bearing wear pattern; we're tightening the PM interval from 12 months to 9 months, and adding a vibration sensor for early warning.

Etch: 88% OEE, target 85%. Above target; good week. One CM on E2 chamber B for a gas line leak, recovered in 3 hours.

CMP: 82% OEE, target 85%. Slipped due to pad-related issues — we ran two pad swaps this week, one outside the scheduled PM window. Pad lifetime is trending shorter on the M2 Cu recipe; coordinating with PIE on whether to tune the recipe or change pad vendor.

MTBF and MTTR:
- MTBF this week: 145 hours (target 160). Driven down by litho CMs.
- MTTR this week: 4.1 hours (target 4.0). On par.

Action items:
- Litho PM interval tightening — close ECN by next Friday.
- CMP pad vendor evaluation — start a side-by-side trial in 2 weeks.
- Etch keep monitoring chamber B post-leak — confirmation lot tonight.

Questions?

相關縮寫:OEE · PM · CM · MTBF · MTTR · ECN · PIE

Deviation Report — Vacuum Leak on E2 Chamber B

蝕刻機台真空洩漏事故 deviation report Section 4 根因分析。

4.0 Root Cause — Vacuum Leak on E2 Chamber B

4.1 Symptom
Chamber B on E2 (M2 RIE) failed base pressure check on 03/10 morning startup. Base pressure rose to 5E-5 Torr vs the 1E-6 Torr spec within 30 minutes. Eight wafers from the prior production window held pending leak isolation.

4.2 Investigation Path
- Helium leak check identified leak at the lower flange of chamber B (5E-8 mbar·L/s).
- Visual inspection: O-ring at lower flange showed compression set; rubber hardness > spec.
- Maintenance log: O-ring last replaced 14 months ago; recommended service interval is 12 months.

4.3 Root Cause Statement
The vacuum leak is attributed to aged O-ring (compression set + hardness exceeding service spec) at the lower flange of E2 chamber B, exceeding the 12-month replacement interval, confirmed by physical inspection and post-replacement leak rate validation.

4.4 Containment
- E2 chamber B held; O-ring replaced; chamber pumped down and validated at 1E-9 mbar·L/s helium leak rate.
- 8 affected wafers held at next post-etch metrology.
- Chamber re-qualified with 5 monitor wafers; particle adder count and ER both within spec.

4.5 Long-Term Action
- O-ring replacement interval tightened from 12 months to 9 months for chambers running corrosive gases.
- O-ring stock inventory increased to support quarterly replacement scheduling.
- FMEA updated to include "O-ring age beyond service life" as a high-severity vacuum failure mode.

相關縮寫:leak · PM · FMEA · qualification

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